January 23, 2014
For the third consecutive year, Fitch Even partners Karl R. Fink, Joseph E. Shipley, and Allen E. Hoover will be teaching at the University of Illinois College of Law as adjunct professors. Their Spring 2014 course, “Current Issues in Patent Defenses,” will present a cutting-edge exploration of recent developments in patent law, with an emphasis on how the ongoing evolution of the law is affecting defenses in patent infringement lawsuits. Topics covered will include recent decisions on inequitable conduct, enablement and written description, statutory subject matter, prior art, noninfringement, and participation in USPTO proceedings.
Established in 1897, the University of Illinois College of Law is one of the oldest and best-known law schools in the nation. It was one of the small number of charter members and founders of the Association of American Law Schools and was on the first national list of law schools approved by the American Bar Association.
In January 2013, the Fitch, Even, Tabin & Flannery LLP Diversity Scholarship was established at the University of Illinois College of Law. This scholarship is intended to promote diversity within the practice of intellectual property law.
IP Alert | Federal Circuit Clarifies Equitable Intervening Rights Extend Beyond Protecting Monetary InvestmentsFebruary 26, 2021
On February 19, in John Bean Technologies Corp. v. Morris & Associates, Inc., the Federal Circuit clarified the types of investments that may be entitled to protections under the doctrine of equitable intervening rights, holding that it can extend beyond a monetary investment. Read more
IP Alert | Knowledge Within the Art Does Not Save Means-Plus-Function Claim Term Lacking Corresponding StructureFebruary 19, 2021
On February 12, in Synchronoss Technologies, Inc. v. Dropbox, Inc., the Federal Circuit affirmed that certain of Synchronoss's claims were invalid for indefiniteness, since the claims included a means-plus-function claim term that did not have adequate structural support in the specification. Read more